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Principal Engineer, Frontend Organizations Central Team, Dry Etch Process

Hiroshima - Fab 15, Japan💼 Full-time🗓 2026-06-18 → 2026-07-31

Core

Lead productivity, yield, and quality improvement engagements for global Dry Etch fleets through plasma process optimization, hardware CIP roadmaps, and defect reduction.

Role type

Principal Engineer, Semiconductor Process & Hardware Optimization

Builds

Dry Etch process windows, hardware CIP roadmaps, and tool efficiency programs for DRAM/NAND manufacturing

Domain

Semiconductor manufacturing (Memory/Storage) - Dry Etch

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

Plasma process optimization, Hardware CIP roadmap development, Defect/particle control, Process capability improvement (CD, profile, selectivity), Supplier partnership management, IoT/FDC telemetry setup, Safety & sustainability compliance, Abnormal analysis (FDC, SPC), Tool qualification flows

Preferred skills

Experience with LAM, TEL, AMAT Dry Etch platforms, DRAM/NAND flow expertise, Energy optimization strategies

Technologies

FDC, SPC, RF match networks, Gas delivery systems, Plasma sources, IoT sensors

Responsibilities

Strategize yield and cost improvement via plasma optimization and chemistry qualification; Develop hardware CIP roadmaps for chamber parts and RF networks; Drive defect reduction and chamber-matching across global fleet; Partner with suppliers on tool acceptance criteria and installation requirements; Improve tool efficiency and utilization through benchmarking; Establish process windows and recipe robustness; Enable energy savings and waste reduction solutions.

Seniority

Principal, hands-on IC with strategy & mentorship

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