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Process Engineer I-IV

(HTA) NCP (Hillsboro, OR)💼 Full-time💰 $64,812–$64,812🗓 2026-04-13 → 2026-07-30

Core

Provide process engineering support for Reactive Ion Etch (RIE/Plasma Etch) equipment sales and development to the semiconductor industry, focusing on advanced process nodes (2nm, 14A, 10A) in FEOL and BEOL dry etch modules.

Role type

Process Engineer (IC)

Builds

Advanced dry etch processes for semiconductor manufacturing

Domain

Semiconductor manufacturing / Plasma etch technology

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

Plasma etch process development, Design of Experiments (DOE), Statistical Process Control (SPC), cleanroom operations, metrology and characterization, Hitachi plasma etch systems operation, data analysis and reporting

Preferred skills

Semiconductor equipment experience, cleanroom/Fab experience, plasma science fundamentals

Technologies

Hitachi plasma etch systems, metrology equipment

Responsibilities

Execute process development, optimization, and DOE-driven tuning to meet customer specifications; support ramp of high-volume manufacturing etch processes; troubleshoot etch module performance; interface with internal customers and global engineering teams; create technical documentation and presentations

Seniority

Entry to Senior (I-IV), hands-on IC

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