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Principal Engineer – NAND Process Pathfinding – Dry Etch

Fab 10N/X, Singapore💼 Full-time🗓 2026-07-08 → 2026-07-31

Core

Developing next-generation NAND memory technology through advanced dry etch process pathfinding and equipment management.

Role type

Principal Engineer – Dry Etch (Semiconductor R&D)

Builds

High-performance NAND memory solutions for AI, mobile, automotive, and data center applications

Domain

Semiconductor manufacturing / Memory technology / Dry Etch

Deliverable

production ML models | product features

Required skills

ICP/CCP plasma etch technologies, plasma-surface interactions, etch chemistry, profile control, dry etch equipment fundamentals, plasma physics, semiconductor process integration, statistical analysis, data analytics, process optimization

Preferred skills

High aspect ratio etch, advanced pattern transfer, selective etch, structural process optimization, machine learning, predictive modeling, automation, virtual process modeling, mentoring engineers

Technologies

AI/ML tools, statistical methodologies, automation, predictive modeling, digital workflows

Responsibilities

Explore advanced dry etch methods to satisfy structural, electrical, yield, and integration demands; Develop new plasma chemistries, process technologies, and equipment capabilities; Apply advanced data analytics and AI/ML tools to accelerate process learning; Drive process pathfinding through automation and predictive modeling; Collaborate with Process Integration, Thin Films, Wet Etch, Diffusion, Lithography, CMP, and Device teams

Seniority

Principal, hands-on IC with strategy & mentorship

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