Albany Photo Lithography Director
Core
Leading High NA EUV initiatives, developing engineering teams, and driving pathfinding projects for next-generation lithography at Micron's NYCreates site.
Role type
Director of Photo Lithography (High NA EUV)
Builds
High NA EUV modules and patterning technologies for semiconductor manufacturing
Domain
Semiconductor manufacturing / Photolithography
Deliverable
production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work
Required skills
High NA EUV lithography expertise, 193nm immersion multiple-patterning (LELE, SAQP), photolithography optics/simulation tools (Prolith, S-Litho), statistical data analysis (JMP, Python), people leadership (5+ direct reports), AI-enabled ways of working
Preferred skills
Technical roadmap definition, vendor partnership, global cross-site collaboration, leading demo/development activities for lithography tools
Technologies
Prolith, S-Litho, JMP, Python
Responsibilities
Lead and nurture a group of engineers and technicians supporting High NA EUV activities; Represent Micron at NYCreates while safeguarding intellectual property; Coordinate tool time, wafer/reticle/material inventory, and shipping logistics for High NA EUV operations; Define and guide patterning pathfinding projects and align with process integration teams; Develop High NA EUV modules collaboratively with Boise, Hiroshima, and other Micron TD locations
Seniority
Director, strategic leadership with hands-on technical oversight