EUV Mask Technology FEOL RND Engineer
Core
Develop AI-assisted EUV mask blank materials and processes to enable next-generation High-NA EUV manufacturing and advanced DRAM scaling.
Role type
Senior IC materials engineer (EUV mask technology)
Builds
Next-generation EUV mask materials, films, and processes for High-NA lithography
Domain
Semiconductor manufacturing, EUV lithography, materials science
Required skills
EUV mask blank material design, film stack design, deposition, etch, clean, and patterning quality, High-NA EUV readiness, lithography requirements translation, DOE and fundamental analysis, FEOL process engineering
Preferred skills
Actinic mask inspection, defect printability analysis, mask repair, BEOL/FEOL process control, tool requirements definition, early-stage tool/process development, lithography simulation, OPC, mask pattern design
Technologies
EUV systems, High-NA EUV, lithography simulation, OPC
Responsibilities
Develop AI-assisted EUV mask blank materials and processes; Advance High-NA EUV readiness through material selection and lithography performance optimization; Translate lithography requirements into manufacturable mask solutions; Conduct data-driven R&D using DOE and fundamental analysis; Collaborate with cross-functional engineering teams to transition new technologies into FEOL process engineering (via careerplan.io/jobs/JR104902-euv-mask-technology-feol-rnd-engineer-at-micron)
Seniority
Senior, hands-on IC