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Photomask R&D Process Integration Engineer

Boise, ID - Main Site💼 Full-time🗓 2026-05-29 → 2026-07-31

Core

Integrating photomask technologies to enable manufacturability for next-generation memory products, specifically High NA EUV.

Role type

Senior IC process integration engineer (photomask R&D)

Builds

Next-generation memory scaling solutions (High NA EUV photomasks)

Domain

Semiconductor manufacturing / Photomask technology

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

Semiconductor process integration, Design of Experiments (DOE), statistical data analysis, project leadership, cross-functional collaboration

Preferred skills

Photomask process development, Model-Based Problem Solving, yield improvement strategies, external partner collaboration

Technologies

High NA EUV, DRAM, NAND

Responsibilities

Lead integration efforts for next-generation photomask manufacturability; Design and implement experiments in mask and wafer fabs; Optimize process flows to meet performance, yield, and cost targets; Drive yield improvement initiatives; Partner with mask R&D, design, and photolithography teams

Seniority

Senior, hands-on IC

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