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Director, Process Engineer – Dry Etch

US, Oregon, Hillsboro💼 Full-time🗓 2026-07-06 → 2026-09-25

Core

Lead dry etch process engineering efforts to drive technology development, process capability, and manufacturability across advanced CMOS technologies for Intel's foundry service.

Role type

Director, Process Engineer (Dry Etch)

Builds

Advanced CMOS technology nodes for Intel foundry customers

Domain

Semiconductor manufacturing / Dry Etch / Plasma Processing

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

dry etch process development, plasma chemistry, etch mechanisms, profile control, selectivity, microloading, CD control, chamber matching, defect reduction, process integration, metrology interpretation, recipe optimization, tool troubleshooting, HVM enablement, supplier engagement

Preferred skills

Doctoral degree, advanced logic technologies (Gate-All-Around), process transfer experience, ramp readiness, excursion response, tool qualification

Technologies

Plasma etch, Reactive Ion Etch (RIE), Atomic Layer Etch (ALE), conductor etch, dielectric etch, thermal etch, post-etch treatment, clean processes

Responsibilities

Define and execute process experiments to resolve tool and process issues; Partner with cross-functional teams and suppliers to meet technology roadmap requirements; Drive improvements in yield, performance, defectivity, uniformity, and cost; Support process development, transfer, optimization, and sustaining activities for multiple technology nodes; Document process learning, best known methods, and control plans.

Seniority

Director, strategic leadership with hands-on technical execution

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