Intern - F10 CVD PEE
Core
Intern role focused on reducing crater defects in TEOS Chemical Vapor Deposition (CVD) processes within high-volume semiconductor manufacturing.
Role type
Semiconductor process engineering intern (thin films)
Builds
High-performance DRAM, NAND, and NOR memory and storage products
Domain
Semiconductor manufacturing / Thin film process engineering
Deliverable
production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work
Required skills
Data analysis, statistical analysis, structured problem-solving, working with large datasets, technical communication
Preferred skills
DOE methodology, engineering trade-off evaluation, defect characterization
Technologies
TEOS CVD, inline defect inspection, manufacturing data analytics
Responsibilities
Study TEOS CVD process flow and chamber conditions, analyze defect and yield data to characterize crater patterns, conduct limited controlled experiments, assess defect improvement results against film performance metrics
Seniority
Intern
