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Intern - EUV & Materials Lithography

Boise, ID - Main Site💼 Internship🗓 2026-08-17 → 2026-09-26

Core

Intern supporting EUV lithography process development, materials optimization, and patterning performance improvements for next-generation memory and semiconductor products.

Role type

Intern, hands-on IC process engineer

Builds

Research initiatives and data analysis supporting photolithography process development

Domain

Semiconductor manufacturing, EUV lithography, materials science

Deliverable

research

Required skills

Design of Experiments (DOE), cleanroom operations, CD-SEM measurements, line width roughness (LWR) analysis, cross-sectional analysis, AI and data-driven methodologies

Preferred skills

Statistics, experimental design, data science, scientific computing programming, automation tools

Technologies

CD-SEM, DOE software, commercial imaging analysis tools

Responsibilities

Design and implement experiments to optimize photolithography processes; Plan, coordinate, and perform experiments in semiconductor cleanroom environments; Analyze and interpret process data and imaging results; Communicate project plans, progress, conclusions, and recommendations through technical reports and presentations; Apply AI and data-driven methodologies to support research and process optimization

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