CareerPlan

Intern - EUV & Materials Lithography

Boise, Idaho, United States of AmericaInternship2026-08-17 → 2026-10-20
On-site

Core

Intern supporting technology innovation in EUV lithography and materials engineering for next-generation memory and semiconductor products.

Role type

Semiconductor process engineering intern (EUV lithography & materials)

Builds

Photolithography process development, materials optimization, and patterning performance improvements

Domain

Semiconductor manufacturing / Photolithography

Deliverable

research

Required skills

Design of Experiments (DOE), semiconductor cleanroom operations, CD-SEM measurements, line width roughness (LWR) analysis, cross-sectional analysis, technical reporting, data analysis

Preferred skills

Statistics, experimental design, data science methodologies, scientific computing programming, AI/data-driven methodologies

Responsibilities

Design and implement DOE experiments for photolithography processes; Plan and perform experiments in semiconductor cleanroom environments; Analyze process data and imaging results; Communicate project plans and findings via reports and presentations; Apply AI and data-driven methodologies to support research and optimization