College Intern - Process & hardware development in PVD chambers for new films: AlN as thermal interface material (TIM), SiN as photonic waveguide .
Core
Intern role focused on optimizing PVD processes and characterizing hardware for developing new films (AlN as thermal interface material, SiN as photonic waveguide) for semiconductor applications.
Role type
Intern, Process & Hardware Development
Builds
PVD chambers and new film materials for semiconductor manufacturing
Domain
Semiconductor manufacturing / Materials science
Deliverable
production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work
Required skills
PVD process optimization, metal film property measurement, hardware characterization, data collection and analysis, Root Cause Analysis, troubleshooting process engineering issues
Preferred skills
None stated
Technologies
Physical Vapor Deposition (PVD), AlN, SiN
Responsibilities
Organize data and reports for review, perform hardware characterization on moderately difficult systems, involve in troubleshooting moderately complex problems and resolve process engineering issues
Seniority
Intern
