Research Fellow (EUV Nanophotonics & Nanopatterning)
Core
Lead the design, fabrication, and integration of chip-scale EUV sources and nanopatterning masks to demonstrate EUV nanophotonics for semiconductor lithography.
Role type
Senior IC experimental physicist (nanophotonics)
Builds
Chip-scale EUV emitters, 10 nm electron-beam-lithography masks, and integrated vacuum/optical systems
Domain
Semiconductor manufacturing, nanophotonics, EUV lithography
Required skills
electron beam systems, high-vacuum/UHV systems, nanofabrication, thin-film deposition, EUV metrology, cold cathode fabrication, optical system design, experimental leadership
Preferred skills
EUV/soft X-ray experience, meta-optics, COMSOL/MEEP simulation
Technologies
SEMs, TEMs, sputtering, CVD, dry etching, electron-beam lithography, Si3N4 membranes, ZnO, graphene, carbon nanotubes, CCDs, MCPs
Responsibilities
Design and assemble high-vacuum/UHV systems and optical setups; fabricate chip-scale EUV emitter components; design and fabricate EUV nanopatterning masks; implement and optimize electron-optical systems and diagnostic tools; oversee detection and spectral analysis of EUV radiation; integrate functional nanostructures into experimental vacuum environments; conduct proof-of-concept demonstrations of EUV nanopatterning; manage experimental workflows, laboratory safety, and mentor students; publish research findings in international journals.
Seniority
Senior, hands-on IC with mentorship