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EUV Lithography Process Development Engineer- TPG

Boise, ID - Main Site💼 Full-time🗓 2026-07-17 → 2026-07-30

Core

Evaluating and enabling next-generation EUV and High NA EUV lithography technologies to support advanced memory scaling and production readiness.

Role type

Senior IC lithography process development engineer

Builds

Next-generation patterning solutions for memory and storage devices

Domain

Semiconductor manufacturing / EUV lithography

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

EUV lithography expertise, 193nm immersion multiple patterning (LELE, SAQP), photolithography optics knowledge, simulation tools (Prolith, S-Litho), process transfer alignment, defect inspection strategy definition

Preferred skills

High NA EUV pathfinding experience, statistical analysis and design of experiments, JMP or Python, AI-assisted analytics for yield improvement

Technologies

EUV tools, 193nm immersion scanners, Prolith, S-Litho, JMP, Python

Responsibilities

Lead pathfinding efforts for advanced patterning technologies across 193nm immersion, EUV, and High NA EUV; Develop and optimize EUV lithography modules in the technology development environment; Partner with defect inspection and mask teams to define EUV mask inspection strategies; Collaborate with manufacturing sites to align process transfer, equipment, and materials readiness; Travel as needed to support High NA EUV development and early learning activities

Seniority

Senior, hands-on IC

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