D&E - Optical Proximity Correction Software Engineer - Hsinchu
Core
Develop algorithms and software for large-scale parallel lithography computational systems to support optical proximity correction (OPC) recipes for semiconductor manufacturing.
Role type
Software Engineer (Lithography Algorithms)
Builds
Large-scale parallel lithography computational systems
Domain
Semiconductor manufacturing / Photolithography
Deliverable
production ML models | product features
Required skills
C/C++, LUA, algorithm development, parallel computing, debugging in restricted environments, technical communication with R&D
Technologies
C/C++, LUA
Responsibilities
Develop algorithms for large-scale parallel lithography computational systems; Cooperate with customers to develop and troubleshoot OPC recipes; Write programs for lithography systems; Debug programs under restricted environments and bounded time; Educate and communicate with customer R&Ds.
Seniority
Individual Contributor