STAGE - Développement de couches Si:B par épitaxie pour les technologies imageurs F/H
Core
Develop selective Si:B epitaxial layers for advanced imaging technologies, focusing on conformity and selectivity to prepare trench filling.
Role type
Junior IC materials engineer (epitaxy)
Builds
Si:B epitaxial layers for imaging sensors
Domain
Semiconductor manufacturing / Imaging technology
Required skills
Si:B epitaxy, ellipsometry, resistivity measurement, AFM, SEM microscopy
Preferred skills
SEM microscopy experience
Technologies
Ellipsometry, AFM, SEM
Responsibilities
Develop selective Si:B epitaxial layers, study conformity and selectivity of epitaxy, conduct studies on full wafers and patterned substrates
Seniority
Junior, Master 2 or final year engineering student