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Intern - Photomask Wet Process Engineering

Boise, Idaho, United States of America💼 Internship🗓 2026-08-20 → 2026-09-25

Core

Develop and optimize advanced wet cleaning and resist strip processes for DUV and EUV photomask fabrication.

Role type

Photomask Wet Process Engineering Intern

Builds

Advanced photomasks for next-generation semiconductor technologies

Domain

Semiconductor manufacturing / Photomask engineering

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

Chemical engineering, Chemistry, Materials Science, Physics, Semiconductor manufacturing processes, Defect engineering, Contamination control, Data analytics, Statistical analysis, Experimental design

Preferred skills

Design of Experiments (DOE), Wafer/mask processing, Python, JMP, Tableau, Power BI, Defect inspection, Metrology, Surface characterization, Machine learning concepts, Generative AI platforms

Technologies

JMP, Python, Tableau, Power BI, Microsoft Copilot

Responsibilities

Support development and optimization of advanced photomask wet cleaning and resist strip processes. Design and implement experiments to evaluate process performance. Analyze defect, contamination, and yield data using statistical and analytical tools. Characterize process equipment and evaluate tool-to-tool matching performance. Collaborate with process, manufacturing, equipment, and metrology engineers to investigate process excursions. Develop process characterizations, qualification plans, and technical documentation. Apply data science and machine learning techniques to identify correlations and yield improvement opportunities.

Seniority

Intern

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