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Principal Engineer, Frontend Organizations Central Team, Dry Etch Process

Hiroshima, Japan💼 Full-time🗓 2026-06-18 → 2026-09-25

Core

Lead productivity, yield, and quality improvement engagements for global Dry Etch fleets through plasma process optimization, hardware CIP roadmaps, and supplier collaboration.

Role type

Principal Engineer, Semiconductor Process & Hardware (Dry Etch)

Builds

Dry Etch process windows, hardware CIP roadmaps, and tool efficiency solutions for DRAM/NAND manufacturing.

Domain

Semiconductor Manufacturing / Dry Etch / Plasma Physics

Deliverable

production ML models | product features | dashboards & analysis | research | client delivery | infrastructure | physical/clinical work

Required skills

Plasma process optimization, Dry Etch hardware qualification, CIP roadmap development, defect/particle control, process window establishment, FDC/SPC analysis, supplier partnership management, tool utilization improvement, sustainability/energy optimization, recipe robustness.

Preferred skills

Experience with LAM, TEL, AMAT Dry Etch platforms, new chemistry/hardware qualification, chamber-matching strategies, IoT/FDC sensor implementation.

Technologies

FDC, SPC, RF networks, Gas delivery systems, ESC, Plasma sources, IoT sensors, Telemetry systems.

Responsibilities

Strategize and lead productivity, yield, quality, and cost improvement engagements; Collaborate on defect reduction, particle control, and CD uniformity; Develop process and hardware CIP roadmaps; Drive process & hardware improvement for safety, cost, and throughput; Partner with suppliers on equipment acceptance criteria and installation; Improve tool efficiency and utilization; Set up IoT/FDC sensors for chamber health monitoring; Establish process windows and recipe robustness; Enable energy savings and waste reduction solutions.

Seniority

Principal, hands-on IC with strategy & mentorship

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