Postdoctoral Appointee - Atomic Layer Deposition for X-ray Optics Fabrication
Core
Develop and optimize atomic layer deposition (ALD) processes for thick multilayer X-ray optics on flat and patterned substrates, and characterize film properties using X-ray and electron microscopy.
Role type
Postdoctoral researcher (materials science/physics)
Builds
Advanced diffractive X-ray optics for the Advanced Photon Source
Domain
X-ray optics, materials science, nanofabrication
Required skills
ALD reactor operation, precursor chemistry, thin-film characterization, electron microscopy (SEM/TEM), X-ray diffraction, X-ray reflectometry
Preferred skills
Reaction kinetics for ALD, thin-film metrology instrumentation, nanofabrication (lithography, DRIE)
Responsibilities
Develop and optimize ALD processes for multilayer structures, characterize film thickness/crystallinity/strain/optical properties, design and commission ALD reactor systems, develop metrology methods for deposition accuracy, test and evaluate diffractive optics at beamlines
Seniority
Postdoctoral, 0-5 years post-PhD
