F16 Metrology Application Engineer
Core
Develop, analyze, and implement metrology measurement techniques (lithography overlay, CD-SEM, ellipsometry, scatterometry, XRF, surface profiling) to support fab operations and process optimization.
Role type
Senior IC metrology application engineer
Builds
Lithography overlay and CD-SEM measurement solutions for semiconductor manufacturing
Domain
Semiconductor manufacturing (memory and storage)
Required skills
Lithography overlay measurement, CD-SEM operation, ellipsometry, scatterometry, XRF, surface profiling, process characterization, NPI transfer support, supplier tool CIP management, quality metric definition, yield improvement analysis
Preferred skills
Next-generation measurement capability analysis, evolutionary program coordination, standardization of best practices (BKM), early engagement with technology development teams
Technologies
CD-SEM, Ellipsometry, Scatterometry, XRF, Surface profiling tools
Responsibilities
Develop and implement metrology techniques for lithography overlay and CD-SEM; Perform SWR lots for new process equipment setup and optimization; Drive supplier tool CIP and NPI transfer activities; Engage in fab operations to improve quality, reduce cost, and improve yield; Deliver value-adding metrology applications and standardize team knowledge.